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PROCESS FOR JOINING POLYDIMETHYLSILOXANE (PDMS) SURFACES.

机译:连接聚二甲基硅氧烷(PDMS)表面的过程。

摘要

The present invention refers to a process for joining surfaces of materials of PDMS used in the manufacture of microfluid devices and in pressure sensors applications. This process consists in joining two PSMS layers of different thicknesses, the first having a thickness of 50 to 500 um and the second, before being cured, having a thickness of 3 to 10 mm. The first layer is obtained from the synthesis of the PDMS deposited by the layer coating system by centrifugation, this layer being previously cured in a furnace at 70°C for 2 hours over a layer of photosensitive resin previously deposited over a silicon substrate. After being cured, a plasma treatment is performed in an oxygen environment by means of reactive ion etching (RIE) at 20W for 10 minutes. After the plasma treatment is performed, a second layer of PDMS being deposited in a liquid manner over the first layer that corresponds to the substrate that supports the membrane; after performing the curing process of the second laye r, the structure being submerged in acetone for being separated from the rigid substrate, obtaining in this manner the structure for joining the two surfaces of PDMS.
机译:本发明涉及一种用于连接PDMS材料表面的方法,该PDMS材料表面用于制造微流体装置和压力传感器应用中。该过程包括将两个不同厚度的PSMS层连接在一起,第一层的厚度为50至500 um,第二层在固化之前的厚度为3至10 mm。第一层是通过离心由层涂布系统沉积的PDMS的合成而获得的,该层预先在70℃的炉中在预先沉积在硅基板上的光敏树脂层上固化2小时。固化后,在氧气环境中通过反应离子蚀刻(RIE)在20W下进行10分钟的等离子体处理。在进行等离子体处理之后,将PDMS的第二层以液态方式沉积在第一层上,该第一层对应于支撑膜的基底;在进行第二层的固化处理之后,将该结构浸没在丙酮中以与刚性基板分离,从而获得用于将PDMS的两个表面接合的结构。

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