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PROCESS FOR PREPARING N-TYPE CUO THIN FILMS, IN SITU, BY HYDROTHERMAL METHOD

机译:水热法原位制备N型CuO薄膜的工艺

摘要

The invention relates to a process for preparing n-type CuO thin films to be used as materials for solar cells, memory resistors and gas sensors. According to the invention, the process uses the hydrothermal method for depositing the n-type copper oxide layer onto a copper plate having two functions: of a substrate and of a precursor material for the thin film, in a medium of potassium hydroxide solution 2.5 M, in tight teflon autoclaves with steel jacket, which are heated to the temperature of 250°C for 30 min, to result in n-type semiconductor copper oxide thin films.
机译:本发明涉及制备用作太阳能电池,存储电阻器和气体传感器的材料的n型CuO薄膜的方法。根据本发明,该方法使用水热法将n型氧化铜层沉积在具有两种功能的铜板上:基板和薄膜的前体材料,在氢氧化钾溶液2.5 M中在带有钢套的密闭聚四氟乙烯高压釜中,将其加热至250°C的温度30分钟,以生成n型半导体氧化铜薄膜。

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