首页> 外国专利> ABERRATION-CORRECTING METHOD, LASER PROCESSING METHOD USING SAID ABERRATION-CORRECTING METHOD, LASER IRRADIATION METHOD USING SAID ABERRATION-CORRECTING METHOD, ABERRATION-CORRECTING DEVICE AND ABERRATION-CORRECTING PROGRAM

ABERRATION-CORRECTING METHOD, LASER PROCESSING METHOD USING SAID ABERRATION-CORRECTING METHOD, LASER IRRADIATION METHOD USING SAID ABERRATION-CORRECTING METHOD, ABERRATION-CORRECTING DEVICE AND ABERRATION-CORRECTING PROGRAM

机译:像差校正方法,使用所述像差校正方法的激光加工方法,使用所述像差校正方法的激光照射方法,像差校正设备和像差校正程序

摘要

In an aberration-correcting method according to an embodiment of the present invention, in an aberration-correcting method for a laser irradiation device 1 which focuses a laser beam on the inside of a transparent medium 60, aberration of a laser beam is corrected so that a focal point of the laser beam is positioned within a range of aberration occurring inside the medium. This aberration range is not less than nxd and not more than nxd+?s from an incidence plane of the medium 60, provided that the refractive index of the medium 60 is defined as n, a depth from an incidence plane of the medium 60 to the focus of the lens 50 is defined as d, and aberration caused by the medium 60 is defined as ?s.
机译:在根据本发明实施例的像差校正方法中,在用于将激光束聚焦在透明介质60的内部的激光照射装置1的像差校正方法中,校正激光束的像差,使得激光束的焦点位于介质内部发生的像差的范围内。如果将介质60的折射率定义为n,即从介质60的入射平面到介质60的深度,则该像差范围从介质60的入射平面不小于nxd且不大于nxd +Δs。将透镜50的焦点定义为d,将由介质60引起的像差定义为Δs。

著录项

  • 公开/公告号PH12014500824B1

    专利类型

  • 公开/公告日2016-05-02

    原文格式PDF

  • 申请/专利权人 HAMAMATSU PHOTONICS K.K.;

    申请/专利号PH20141500824

  • 申请日2014-04-14

  • 分类号B23K26/06;B23K26/073;G02B13;G02F1/01;H01S3/10;

  • 国家 PH

  • 入库时间 2022-08-21 14:22:52

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