AN OPTICAL DEVICE FOR OBSERVING THE MILLIMETRIC OR SUBMILLIMETRIC STRUCTURAL DETAILS OF AN OBJECT WITH SPECULAR BEHAVIOUR

摘要

A device for observation,by reflection, of the structural details of anobject (2) that exhibits a behaviour that is atleast partially specular, located in an exposurearea, which includes: at least one radiationsource with an emission surface (6) possessingat least two distinct zones (26, 27) emittingstreams of radiation, where at least one ofthe characteristics differs from one zone tothe next; an optical projection system that islocated in line with the radiation source inrelation to the exposure zone, in the path ofthe radiation; an optical exposure system (18)designed to optically link the entry aperture(14) of the optical projection system and theemission surface (6); a projection surface (10)that is linked optically with the object in theexposure zone, and whose received radiationdepends on the deflection on the object (2).