METHODS FOR WET CHEMISTRY POLISHING FOR IMPROVED LOW VISCOSITY PRINTING IN SOLAR CELL FABRICATION

摘要

A method of manufacturing a solar cell is disclosed. The method includes forming a polished surface on a silicon substrate; And forming a first fluidic matrix in an intermeshed pattern on the polished surface, wherein the polished surface is formed by the first fluidic matrix forming an intermeshed pattern comprising features of uniform thickness and width . In one embodiment, the method includes forming a silicon substrate using a method such as but not limited to diamond wire or slurry wafer ring processes. In another embodiment, the chemical This method is not however limited to, such as sulfuric acid (H ₂ SO _4), acetic acid (CH ₃ COOH), nitric acid (HNO _3), hydrofluoric acid (HF) and phosphoric acid (H ₃ PO ₄₎ And forming a polished surface on the silicon substrate using an etchant. In another embodiment, the etchant is an isotropic etchant. In another embodiment, the method includes providing a surface of a silicon substrate having a peak-to-valley roughness of at most 500 nanometers.