首页> 外国专利> COMPOSITION FOR FORMING A THIN LAYER OF LOW REFRACTIVE INDEX, MANUFACTURING METHOD THEREOF, AND MANUFACTURING METHOD OF A THIN LAYER OF LOW REFRACTIVE INDEX

COMPOSITION FOR FORMING A THIN LAYER OF LOW REFRACTIVE INDEX, MANUFACTURING METHOD THEREOF, AND MANUFACTURING METHOD OF A THIN LAYER OF LOW REFRACTIVE INDEX

机译:低折射率的薄层的形成方法,其制造方法以及低折射率的薄层的制造方法

摘要

It is excellent with low refractive index and high preventive effect to provide a kind of film-forming composition, with the adhesiveness or waterproofness of substrate and the film surface of soil resistance, manufacturing method, and the method for forming film have refractive index. It is to pass through mixing silicon alcoxide (water) and (B groups), inorganic or organic acid (C groups) by producing the silicon alcoxide (one) of hydrolysate that the composition, which forms the preparation with low refractive index film, and organic solvent (D types) is according to a certain ratio, there is additional mixing silica solution (E) fumed silica particles dispersion to form according to a certain ratio to hydrolysate in liquid medium. ;The 2016 of copyright KIPO submissions
机译:提供一种具有低折射率和高预防效果的成膜组合物,其具有基材与膜表面的粘附性或防水性和耐污性,制造方法以及成膜方法具有折射率。通过形成水解物的组合物,形成低折射率膜的制剂,是使氧化硅(水)与(B基团),无机或有机酸(C基团)混合,并形成水解物。有机溶剂(D型)是按一定比例混合的,另外还有混合二氧化硅溶液(E)的气相二氧化硅颗粒按一定比例形成分散液以在液体介质中水解。 ; 2016年版权KIPO提交文件

著录项

  • 公开/公告号KR20150131499A

    专利类型

  • 公开/公告日2015-11-25

    原文格式PDF

  • 申请/专利权人 MITSUBISHI MATERIALS CORP.;

    申请/专利号KR20140058190

  • 发明设计人 HIGANO SATOKO;YAMASAKI KAZUHIKO;

    申请日2014-05-15

  • 分类号C08L83/02;C08J5/18;C08K3/36;C08L83/04;G02B1/11;

  • 国家 KR

  • 入库时间 2022-08-21 14:15:50

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