METHOD AND APPARATUS TO DEPOSIT PURE TITANIUM THIN FILM AT LOW TEMPERATURE USING TITANIUM TETRAIODIDE PRECURSOR

摘要

Methods of depositing highly conformal and pure titanium films at low temperatures are provided. Methods involve exposing a substrate to titanium tetraiodide, purging the chamber, exposing the substrate to a plasma, purging the chamber, and repeating these operations. Titanium films are deposited at low temperatures less than about 450 DEG C.