首页> 外国专利> COPPER METAL FILM METHOD FOR PRODUCING SAME COPPER METAL PATTERN CONDUCTIVE WIRING LINE USING THE COPPER METAL PATTERN COPPER METAL BUMP HEAT CONDUCTION PATH BONDIG MATERIAL AND LIQUID COMPOSITION

COPPER METAL FILM METHOD FOR PRODUCING SAME COPPER METAL PATTERN CONDUCTIVE WIRING LINE USING THE COPPER METAL PATTERN COPPER METAL BUMP HEAT CONDUCTION PATH BONDIG MATERIAL AND LIQUID COMPOSITION

机译:铜金属膜的制备方法:利用铜金属图案,铜金属凸块的导热路径,邦迪基材料和液体成分,生产相同的铜金属图案导电线

摘要

Provided is a metal copper film having good substrate adhesion, low volume resistivity and deep metallicity, and a method for producing a metal copper film by reducing the metal copper film to the deep portion without damaging the substrate. The copper-based particle deposited layer containing copper oxide and a transition metal or an alloy of metal or a transition metal complex including a metal element is treated with gaseous formic acid and / or formaldehyde heated to 120 ° C or higher Wherein the copper film is a copper film. The transition metal, alloy or transition metal complex is preferably at least one element selected from the group consisting of Cu, Pd, Pt, Ni, Ag, Au, and Rh, , An alloy containing the metal, or a complex containing the metal element.
机译:本发明提供具有良好的基板密合性,低的体积电阻率和深的金属感的金属铜膜,以及在不损伤基板的情况下将金属铜膜缩小至较深的部分的金属铜膜的制造方法。用加热至120℃或更高温度的气态甲酸和/或甲醛处理包含氧化铜和过渡金属或过渡金属或包含金属元素的过渡金属络合物的合金的铜基颗粒沉积层,其中铜膜。过渡金属,合金或过渡金属配合物优选为选自由Cu,Pd,Pt,Ni,Ag,Au和Rh组成的组中的至少一种元素,包含金属的合金或包含金属元素的配合物。 。

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