COMPOSITION FOR CHEMICALLY POLISHING ALLUMINIUM AFTER DEEP-DRAWING PROCESS AND THE PROCESS FOR CHEMICALLY POLISHING THE SURFACE OF ALLUMINIUM THEREBY

摘要

The present invention relates to a composition for chemically polishing aluminum after an aluminum deep-drawing process and a method for chemically polishing aluminum using the same, and more specifically, to a method for chemically polishing aluminum which polishes a surface of aluminum to alleviate a problem of losing metal luster and creating a boundary when forming an aluminum ingot to improve metal luster and decrease average roughness. The composition for chemically polishing aluminum after an aluminum deep-drawing process comprises 1-10 wt% of nitric acid (HNO_3) and 10-50 wt% of water (H_2O) based on 100 wt% of phosphoric acid (H_3PO_4).