MODIFIED HYDROXY NAPHTHALENE NOVOLAK RESIN, PRODUCTION METHOD FOR MODIFIED HYDROXY NAPHTHALENE NOVOLAK RESIN, PHOTOSENSITIVE COMPOSITION, RESIST MATERIAL AND COATING

摘要

the present invention is light sensitivity, resolution, high alkali developability, heat resistance, moisture absorption also is an object to provide an optimal modified hydroxynaphthalenecarboxylic novolak resin excellent photosensitive composition as a resist material, following structural formula (1) (Wherein, R ¹ is any one of a hydrogen atom, a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, a trialkylsilyl group, m is 1, or is 2. R ² are each independently hydrogen, alkyl, alkoxy and groups, aryl groups, aralkyl groups, modified to the structural moiety (I) represented by any one) of the halogen atom in the repeating unit and hydroxynaphthalenecarboxylic novolak resin, present in the resin R ¹ at least one of the tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, a trialkylsilyl group resin provide.