首页> 外国专利> METHOD OF FORMING TANTALUM COATING FILM AND STRUCTURE FRAME MANUFACTURED BY THE SAME

METHOD OF FORMING TANTALUM COATING FILM AND STRUCTURE FRAME MANUFACTURED BY THE SAME

机译:形成钽涂层膜的方法和由其制造的结构框架

摘要

Disclosed are a method for forming a tantalum coating film and a structural member manufactured by the same. According to the present invention, the method for forming a tantalum coating film includes: (a) a step of welding a tantalum wire and a base material; (b) a step of forming molten salt consisting of LiF, NaF, and K_2TaF_7, wherein the molten salt is to electroplate tantalum; (c) a step of inserting a platinum wire as a reference electrode and the tantalum wire and the base material as a work electrode, into the molten sa and (d) a step of electrodepositing tantalum metal to the base material by applying a current to the base material. The method for forming a tantalum coating film is to solve a problem in which a coating film is not formed due to the formation of an oxide film (TaO_x) and mixed-melting of a welding unit in electroplating of the molten salt by using a double welding method and controlling a concentration of a coating raw material.
机译:公开了一种形成钽涂膜的方法和由其制造的结构构件。根据本发明,形成钽涂膜的方法包括:(a)焊接钽丝和基材的步骤; (b)形成由LiF,NaF和K_2TaF_7组成的熔融盐的步骤,其中所述熔融盐用于电镀钽; (c)将铂线作为参比电极并将钽线和基材作为工作电极插入熔融盐中的步骤; (d)通过向基础材料施加电流而将钽金属电沉积至基础材料的步骤。钽涂膜的形成方法是为了解决以下问题:由于在电镀熔融盐时使用氧化膜(TaO_x)的形成和焊接单元的混合熔融,因此无法形成涂膜。焊接方法和控制涂料原料的浓度。

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