首页> 外国专利> SOURCE PATCH DETERMINING METHOD FOR RECONSTRUCTING TARGET PATCH AND EXEMPLAR BASED IMAGE INPAINTING

SOURCE PATCH DETERMINING METHOD FOR RECONSTRUCTING TARGET PATCH AND EXEMPLAR BASED IMAGE INPAINTING

机译:重构目标补丁和基于样例的图像插入的源补丁确定方法

摘要

Provided is a technique for searching for a source patch for high-quality image inpainting. Furthermore, provided is a method for image inpainting. A source patch determination method for reconstructing a target patch comprises the steps of: determining, by an image processing device, a target patch, required to be reconstructed, based on priorities of pixels located in a boundary region of a reconstruction region in an image including a source region and the reconstruction region required to be reconstructed; calculating, by the image processing device, mean-squared error distortion (MSE distortion) values and side matching distortion (SMD) values between the target patch and candidate source patches in the source region; and determining, by the image processing device, a final source patch for reconstruction of the target patch among the candidate source patches based on values obtained by adding the mean-squared error distortion values and the side matching distortion values.
机译:提供一种搜索用于高质量图像修复的源补丁的技术。此外,提供了一种用于图像修复的方法。用于重建目标补丁的源补丁确定方法包括以下步骤:由图像处理设备基于位于图像中的重建区域的边界区域中的像素的优先级,确定需要重建的目标补丁。源区域和需要重建的重建区域;所述图像处理装置计算所述源区域中所述目标斑块与候选源斑块之间的均方误差失真(MSE失真)值和边匹配失真(SMD)值;图像处理设备基于通过将均方误差失真值和边匹配失真值相加而获得的值,确定用于在候选源补丁中重构目标补丁的最终源补丁。

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