首页> 外国专利> OPTICAL WAVEGUIDE TYPE SATURABLE ABSORBER USING EVANESCENT FIELD INTERACTION AND MANUFACTURING METHOD THEREOF, PULSE LASER APPARATUS USING THE SAME, AND PULSE LASER USING THE SAME

OPTICAL WAVEGUIDE TYPE SATURABLE ABSORBER USING EVANESCENT FIELD INTERACTION AND MANUFACTURING METHOD THEREOF, PULSE LASER APPARATUS USING THE SAME, AND PULSE LASER USING THE SAME

机译:使用虚场相互作用的光学波导型可饱和吸收体及其制造方法,使用相同的脉冲激光装置以及使用相同的脉冲激光

摘要

The present invention relates to an optical waveguide-type saturable absorber and, more specifically, relates to an optical waveguide-type saturable absorber using evanescent field interaction which is installed to be used to achieve mode-locking in a femtosecond laser cavity; a manufacturing method thereof, and a femtosecond laser using the same. The method of manufacturing the optical waveguide-type saturable absorber using evanescent field interaction comprises: (a) a step of manufacturing an arrangement-type optical waveguide on a wafer; (b) a step of selectively removing upper parts of the arrangement-type optical waveguide at predetermined intervals to allow an evanescent field of light, which progresses on the arrangement-type optical waveguide manufactured in step (a), to leak to a surface of the optical waveguide and coat the upper part of the arrangement-type optical waveguide which includes the removed parts and has the predetermined intervals with saturable absorbing material, thereby manufacturing an arrangement-type saturable absorbing body with predetermined intervals; and (c) a step of dicing the arrangement-type saturable absorbing body manufactured in step (b) to individually be separated. According to the present invention, mass production of the optical waveguide-type saturable absorber using evanescent field interaction is able to be achieved using a substrate processing technique.
机译:本发明涉及一种光波导型可饱和吸收器,更具体地说,涉及一种利用e逝场相互作用的光波导型可饱和吸收器,其被安装用于在飞秒激光腔中实现锁模。的制造方法以及使用该方法的飞秒激光器。利用瞬逝场相互作用制造光波导型可饱和吸收体的方法包括:(a)在晶片上制造排列型光波导的步骤; (b)以预定间隔有选择地去除排列型光波导的上部的步骤,以使在步骤(a)中制造的排列型光波导上传播的van逝光泄漏到光的表面。然后,在上述光波导路中,在上述配置型光波导路的上部除去包含上述除去的部分并具有规定间隔的上述饱和吸收性材料,从而以规定间隔制造上述排列型饱和吸收性体。 (c)将在步骤(b)中制造的排列型可饱和吸收体切成小块的步骤。根据本发明,能够利用基板处理技术来实现利用e逝场相互作用的光波导型可饱和吸收体的大量生产。

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