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OPTICAL WAVEGUIDE TYPE SATURABLE ABSORBER USING EVANESCENT FIELD INTERACTION AND MANUFACTURING METHOD THEREOF, PULSE LASER APPARATUS USING THE SAME, AND PULSE LASER USING THE SAME
OPTICAL WAVEGUIDE TYPE SATURABLE ABSORBER USING EVANESCENT FIELD INTERACTION AND MANUFACTURING METHOD THEREOF, PULSE LASER APPARATUS USING THE SAME, AND PULSE LASER USING THE SAME
The present invention relates to an optical waveguide-type saturable absorber and, more specifically, relates to an optical waveguide-type saturable absorber using evanescent field interaction which is installed to be used to achieve mode-locking in a femtosecond laser cavity; a manufacturing method thereof, and a femtosecond laser using the same. The method of manufacturing the optical waveguide-type saturable absorber using evanescent field interaction comprises: (a) a step of manufacturing an arrangement-type optical waveguide on a wafer; (b) a step of selectively removing upper parts of the arrangement-type optical waveguide at predetermined intervals to allow an evanescent field of light, which progresses on the arrangement-type optical waveguide manufactured in step (a), to leak to a surface of the optical waveguide and coat the upper part of the arrangement-type optical waveguide which includes the removed parts and has the predetermined intervals with saturable absorbing material, thereby manufacturing an arrangement-type saturable absorbing body with predetermined intervals; and (c) a step of dicing the arrangement-type saturable absorbing body manufactured in step (b) to individually be separated. According to the present invention, mass production of the optical waveguide-type saturable absorber using evanescent field interaction is able to be achieved using a substrate processing technique.
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