Apparatus depositing thin film and method of depositing thin film using ozone plasma

摘要

The present invention relates to a thin film deposition apparatus capable of generating an ozone plasma and using the same to deposit a thin film, and a thin film deposition method capable of depositing a thin film using an ozone plasma. A thin film deposition apparatus according to the present invention includes a reactor having an accommodating portion formed therein, a substrate supporter installed inside the reactor and on which a substrate is placed, a source gas supply line provided on the top of the substrate supporter, A source gas inlet and a reaction gas inlet through which a source gas for thin film deposition and a reaction gas including ozone (O ₃ ) are respectively introduced into the reaction chamber are formed through a supply line, and a source gas and a reactive gas A gas jetting body having a source gas jetting port and a reactive gas jetting port for jetting toward the substrate support and an ozone plasma supplying means for supplying ozone plasma on the substrate.