PHOTOSENSITIVE RESIN COMPOSITION PHOTO SPACER AND METHOD OF FORMING THE SAME PROTECTIVE LAYER COLORED PATTERN SUBSTRATE FOR A DISPLAY AND DISPLAY DEVICE

摘要

The present invention relates to a resin having branching and / or alicyclic structure, acidic group and substituted alkyl group in the side chain [A], wherein the substituted alkyl group has two ethylenically unsaturated bonds and [B] a resin having an ethylenically unsaturated bond There is provided a photosensitive resin composition containing a polymerizable compound and a [C] photopolymerization initiator, which is capable of forming a pattern structure or a protective film having high sensitivity, excellent in storage stability in a liquid state, and excellent in stability over time of a photosensitive film after film formation .;Photosensitive resin composition, photo spacer, protective film, coloring pattern, substrate for display device, display device