Method for Controlling Operation of Evaporation Source to Improve Uniformity of Deposition Thin Film

摘要

The present invention relates to a method for controlling the operation of an evaporation source for improving the uniformity of a deposited thin film, including a plurality of crucibles in which different evaporation materials are accommodated, a plurality of distribution tubes for spraying respective evaporation materials from the crucibles, And a heating means for heating the evaporation material, the method comprising the steps of: (a) controlling the flow rate of the evaporation material in the evaporation source Heating the nozzle unit; (b) heating the heating unit to evaporate the evaporation materials in the plurality of crucibles, respectively; and (c) if the raw material stored in the crucible is consumed for a predetermined period of time, (D) increasing or decreasing the rate of any deposition material of the deposition material, If yaw is that by including the steps for raising or lowering the crucible to form a deposited film more uniform and improve the quality of the device, can increase the yield of the product effect thereto.