ADJUSTABLE GAP CAPACITIVELY COUPLED RF PLASMA REACTOR INCLUDING LATERAL BELLOWS AND NON-CONTACT PARTICLE SEAL

摘要

The plasma processing chamber includes a cantilever assembly and at least one vacuum separating member configured to extinguish the atmospheric load. The chamber includes a wall surrounding the inner region and having an opening formed therein. The cantilever assembly includes a substrate support for supporting the substrate within the chamber. The cantilever assembly extends through the opening such that a portion is located outside the chamber. The chamber includes an actuation mechanism operative to move the cantilever assembly relative to the wall.