Preparation Method of ZnOS Thin Film Using Sputtering Deposition

摘要

The present invention relates to a method for manufacturing a Zn (O,S) thin film. More particularly, the present invention relates to a method for manufacturing a Zn(O,S) thin film and a Zn(O,S) thin film manufactured by the same. The Zn(O,S) thin film with excellent optical properties and structural properties can be manufactured by optical sputtering deposition. The surface of the Zn(O,S) thin film is wide and has no pin hole. The method includes a step of inputting a substrate and a target into a chamber and a step of forming a Zn (O,S) thin film on the substrate at 200-400C.