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An optical system for homogenization of the intensity of laser radiation

机译:一种用于均匀化激光辐射强度的光学系统

摘要

An optical system (10) for the homogenization of the intensity of laser radiation, in particular for a plant for the processing of thin film layers, comprises a beam shaping means (12), which is adapted to a laser beam (14) to form in such a way that a beam profile (16, 36) of the laser beam (14) a long axis (y) and a short axis (x), a in the beam path of the laser beam (14) of the beam shaping means (12), which is arranged downstream of an imaging device (18), which is adapted to the thus shaped laser beam (14) as an illumination line (22), as well as a diaphragm device (30) with at least one diaphragm element (32, 32a, 32b), which in the beam path of the laser beam (14) in at least one side (34, 34a, 34b) of the radiation profile (16, 36) extending along the long axis (y) of the radiation profile (16, 36) extends, which projects in such a way that, by means of partial blanking of the beam profile (16, 36) the radiation profile (16, 36), a locally limited recess (38, 38a, 38b) on the at least one side (34, 34a, 34b) of the radiation profile (16, 36) comprises.
机译:用于使激光辐射强度均匀化的光学系统(10),特别是用于处理薄膜层的设备,包括光束整形装置(12),该光束整形装置适合于激光束(14)以形成以这样的方式,使得激光束(14)的光束轮廓(16、36)为长轴(y)和短轴(x),在光束成形的激光束(14)的光路上装置(12),其布置在成像设备(18)的下游,该成像设备(18)适合于作为照明线(22)的如此成形的激光束(14),以及具有至少一个的光阑设备(30)膜片元件(32、32a,32b),其在激光束(14)的光路中在辐射轮廓(16、36)的至少一侧(34、34a,34b)中沿长轴(y)延伸)延伸出辐射轮廓(16、36),其以这样的方式伸出,使得通过部分消隐辐射轮廓(16、36)来限制光束轮廓(16、36),局部限制凹部(38, 38a,38b)辐射轮廓(16、36)的至少一侧(34、34a,34b)包括。

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