A method for producing a rare earth element doped piezoelectric material comprising a first component, a second component and the rare earth element. The method includes: providing a substrate; initially flowing hydrogen over the substrate; after the initial flow of hydrogen over the substrate, flowing the first component to form the rare earth element doped piezoelectric material over a surface of a single target, the target comprising the rare earth element in a certain atomic percentage; and sputtering the rare earth element doped piezoelectric material from the target onto the substrate.
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