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METHOD FOR TRACKING THE DEGASSING RATE BY MEASURING PARTIAL PRESSURES MEASURED BY MASS SPECTROMETRY

机译:通过质谱法测量分压来跟踪脱气率的方法

摘要

A method for following the degassing of a component placed in a vacuum chamber, comprises: measuring partial pressures Pi for a set M of reference atomic masses, by means of a mass spectrometer connected to the vacuum chamber; determining a degassing rate , at least as a function of the measured partial pressures Pi; and, calculating a slope of the variation in the degassing rate. The degassing rate may advantageously be determined by calculation by means of a relationship of the type: = i M   i  P i i = 0 N   i  P i where M denotes the set of reference atomic masses, Pi denotes the partial pressures for the atomic masses measured by the mass spectrometer, the coefficients i denote preset weighting coefficients associated with each partial pressure Pi, and N denotes a maximum atomic mass for which the partial pressure Pi can be measured by the mass spectrometer.
机译:一种用于对置于真空室中的部件进行脱气的方法,该方法包括:通过连接到真空室的质谱仪,测量一组参考原子质量M的分压Pi;至少根据测得的分压Pi确定脱气率;计算除气率变化的斜率。可以有利地通过以下类型的关系通过计算来确定脱气速率:= i M i i P i ii = 0 N i i Pi其中M表示参考原子质量的集合,Pi表示部分原子质量对于由质谱仪测量的原子质量的最大压力,系数i表示与每个分压Pi相关的预设加权系数,并且N表示可以通过质谱仪测量的最大原子质量。

著录项

  • 公开/公告号FR3010186B1

    专利类型

  • 公开/公告日2016-04-29

    原文格式PDF

  • 申请/专利权人 THALES;

    申请/专利号FR20130002014

  • 发明设计人 ALAIN ROGER DANTE BETTACCHIOLI;

    申请日2013-08-30

  • 分类号G01N30/72;G01N7;

  • 国家 FR

  • 入库时间 2022-08-21 14:08:39

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