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Semi-aqueous stripping and cleaning formulation for metal substrate and methods for using same
Semi-aqueous stripping and cleaning formulation for metal substrate and methods for using same
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机译:用于金属基材的半水剥离和清洁配方及其使用方法
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摘要
Semi-aqueous formulations to remove bulk photoresists, post-etched and post-ashed residues, as well as contaminations comprises an alkanolamine, a water miscible organic co-solvent, a quaternary ammonium compound, a non-free acid functionality corrosion inhibitor, and remainder water. The pH is greater than 9 and the formulation does not contain a free acid functionality corrosion inhibitor.
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