首页> 外国专利> Quaternary phosphonium salt, epoxy resin composition for encapsulating semiconductor device including the quaternary phosphonium salt and semiconductor device encapsulated with the epoxy resin composition

Quaternary phosphonium salt, epoxy resin composition for encapsulating semiconductor device including the quaternary phosphonium salt and semiconductor device encapsulated with the epoxy resin composition

机译:季phospho盐,用于封装包括季phospho盐的半导体器件的环氧树脂组合物以及用该环氧树脂组合物封装的半导体器件

摘要

Disclosed herein is an epoxy resin composition for encapsulating a semiconductor device. The epoxy resin composition includes an epoxy resin, a curing agent, a curing accelerator, and an inorganic filler. The curing accelerator includes a quaternary phosphonium salt of Formula 1: wherein R 1 , R 2 , R 3 , and R 4 are each independently a substituted or unsubstituted C 1 -C 30 hydrocarbon group, or a substituted or unsubstituted C 1 -C 30 hydrocarbon group including at least one heteroatom; X is a substituted or unsubstituted C 1 -C 30 hydrocarbon group, or a substituted or unsubstituted C 1 -C 30 hydrocarbon group including at least one heteroatom; Y is a substituted or unsubstituted C 1 -C 30 hydrocarbon group, or Si substituted with one to three substituted or unsubstituted C 1 -C 30 hydrocarbon groups; n and m are each independently an integer from 1 to 6; 1 is a number greater than 0 to 6, provided that when Y is Si, the sum of m and the number of the substituents is a maximum of 4. The epoxy resin composition has good room temperature storage stability, sufficient flowability upon curing, and high curability. Examples for salts according to the application are:
机译:本文公开了用于封装半导体器件的环氧树脂组合物。环氧树脂组合物包括环氧树脂,固化剂,固化促进剂和无机填料。固化促进剂包括式1的季phospho盐:其中R 1,R 2,R 3和R 4各自独立地为取代或未取代的C 1 -C 30烃基,或包括至少一个杂原子的取代或未取代的C 1 -C 30烃基; X为取代或未取代的C 1 -C 30烃基,或包括至少一个杂原子的取代或未取代的C 1 -C 30烃基; Y是取代或未取代的C 1 -C 30烃基,或被1-3个取代或未取代的C 1 -C 30烃基取代的Si; n和m分别独立地是1至6的整数;如果Y是Si,则m为1,取代基的总数为4以下。1是大于0〜6的数。环氧树脂组合物的室温保存稳定性,固化时的流动性,高固化性。根据应用的盐的例子有:

著录项

  • 公开/公告号EP2746287B1

    专利类型

  • 公开/公告日2017-05-24

    原文格式PDF

  • 申请/专利权人 CHEIL INDUSTRIES INC.;

    申请/专利号EP20130190489

  • 发明设计人 KIM MIN GYUM;HAN SEUNG;CHEON HWAN SUNG;

    申请日2013-10-28

  • 分类号C08G59/08;C08G59/62;C08G59/68;C08K5/50;C08K5/5419;H01L23/29;C07F9/54;C08L63;

  • 国家 EP

  • 入库时间 2022-08-21 14:05:45

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