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ION IMPLANTATION SYSTEM AND PROCESS FOR ULTRASENSITIVE DETERMINATION OF TARGET ISOTOPES
ION IMPLANTATION SYSTEM AND PROCESS FOR ULTRASENSITIVE DETERMINATION OF TARGET ISOTOPES
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机译:离子注入系统及目标同位素的超灵敏测定方法
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摘要
A system and process are disclosed for ultrasensitive determination of target isotopes of analytical interest in a sample. Target isotopes may be implanted in an implant area on a high-purity substrate to pre-concentrate the target isotopes free of contaminants. A known quantity of a tracer isotope may also be implanted. Target isotopes and tracer isotopes may be determined in a mass spectrometer. The present invention provides ultrasensitive determination of target isotopes in the sample.
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