Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process

摘要

PROBLEM TO BE SOLVED: To provide a resist underlayer film applicable not only to a negatively developed resist pattern formed by a hydrophilic organic compound but also to a conventional positively developed resist pattern formed by a hydrophobic compound.;SOLUTION: A silicon-containing surface modifier contains one or more of a repeating unit shown by the specified general formula (A) and a partial structure shown by the specified general formula (C).;COPYRIGHT: (C)2013,JPO&INPIT