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MODEL FOR ACCURATE PHOTORESIST PROFILE PREDICTION
MODEL FOR ACCURATE PHOTORESIST PROFILE PREDICTION
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机译:精确的光阻轮廓预测模型
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摘要
A photoresist modelling system includes a mathematical model for a photolithography process. The mathematical model may be executable using a computer processor. The mathematical model may be used to model a photoresist as formed on a semiconductor wafer surface. A blocked polymer concentration gradient equation may be implemented into the mathematical model. The blocked polymer concentration gradient equation may describe an initial concentration gradient of a blocked polymer in the photoresist being modelled by the mathematical model.
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