MEASUREMENT METHOD FOR PLASMA STATE IN PLASMA PROCESSING APPARATUS, AND PLASMA MEASUREMENT DEVICE USED FOR THE MEASUREMENT METHOD

摘要

PROBLEM TO BE SOLVED: To provide a measurement method for a plasma state in a plasma processing apparatus capable of accurately measuring the plasma state in each of fine regions within a measuring surface, and a plasma measurement device used for the measurement method.;SOLUTION: On a measurement surface of a measurement base, an electrical shield pattern and multiple electrodes having the same or substantially same electrode surface are provided, the electrode being defined by the shield pattern, and on a front face where the electrodes are provided, the electrodes are disposed while being electrically independent of each other. At a rear face side where a surface area of the electrodes is opposite to the measurement surface, signal processing means is provided for performing signal processing on electric signals from the electrodes.;SELECTED DRAWING: Figure 1;COPYRIGHT: (C)2018,JPO&INPIT