首页> 外国专利> LITHIUM COBALTATE SINTERED COMPACT, SPUTTERING TARGET MANUFACTURED USING SAID SINTERED COMPACT, METHOD FOR PRODUCING LITHIUM COBALTATE SINTERED COMPACT, AND THIN FILM MADE OF LITHIUM COBALTATE

LITHIUM COBALTATE SINTERED COMPACT, SPUTTERING TARGET MANUFACTURED USING SAID SINTERED COMPACT, METHOD FOR PRODUCING LITHIUM COBALTATE SINTERED COMPACT, AND THIN FILM MADE OF LITHIUM COBALTATE

机译:钴酸锂烧结体,使用烧结烧结体制造的靶材,钴酸锂烧结体的制备方法以及钴酸锂的薄膜制备

摘要

PROBLEM TO BE SOLVED: To provide a sputtering target that has a high strength and allows a stable sputtering, and a production method and thin film thereof.SOLUTION: The method for producing a sintered compact includes: spray drying a lithium cobaltate slurry to manufacture a granulated powder having an average particle size of 20 to 150 μm; cold pressing and/or CIP molding the granulated powder; and sintering the obtained molded compact in an atmosphere containing oxygen by 99 vol% or more at 1000 to 1100°C for 20 hours or more and 40 hours or less, to produce a sintered compact having a flexural strength of 100 MPa or more and an average value of bulk resistance of 100 Ω-cm or less.SELECTED DRAWING: None
机译:解决的问题:提供具有高强度并允许稳定溅射的溅射靶及其制造方法和薄膜。解决方案:用于制造烧结体的方法包括:喷雾干燥钴酸锂浆料以制造粉末。平均粒径为20至150μm的粒状粉末;冷压和/或CIP成型颗粒状粉末;将得到的成型体在1000〜1100℃的含氧量为99体积%以上的气氛中烧结20小时以上且40小时以下,从而得到弯曲强度为100MPa以上的烧结体。体电阻的平均值小于或等于100Ω-cm。

著录项

  • 公开/公告号JP2017165626A

    专利类型

  • 公开/公告日2017-09-21

    原文格式PDF

  • 申请/专利权人 JX NIPPON MINING & METALS CORP;

    申请/专利号JP20160053865

  • 发明设计人 ENDO YOSUKE;SATO KAZUYUKI;SUZUKI SATORU;

    申请日2016-03-17

  • 分类号C04B35;C23C14/08;C23C14/34;H01M4/525;H01M4/131;H01M4/1391;

  • 国家 JP

  • 入库时间 2022-08-21 14:01:38

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