HYDROGEN PLASMA PROCESSING DEVICE AND HYDROGEN PLASMA PROCESSING METHOD
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机译:氢等离子体处理装置及氢等离子体处理方法
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摘要
PROBLEM TO BE SOLVED: To provide: a hydrogen plasma processing device having a substrate-transporting arrangement which contributes to the increase in production efficiency; and a hydrogen plasma processing method.SOLUTION: A hydrogen plasma processing device 10 comprises: an atmospheric pressure process chamber 12; a plasma head 14 set in the atmospheric pressure process chamber 12, and serving to generate a line form of hydrogen-containing plasma P; and a transporting part 16 set in the atmospheric pressure process chamber 12, and serving to transport a disc-like substrate in a thickness direction of the plasma with respect to the plasma head 14, provided that the disc-like substrate has a substrate diameter longer than a thickness of the plasma and shorter than a width of the plasma. The transporting part 16 includes a round heating region for holding and heating the disc-like substrate, which has a shape corresponding to that of the disc-like substrate.SELECTED DRAWING: Figure 1
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