SPUTTERING TARGET CONSISTING OF BiFeO3 BASED SINTERED BODY AND METHOD FOR MANUFACTURING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a target consisting of a sintered body hardly generating the deposition of metal Bi, and capable of reducing the occurrence of particles or arcing, stably depositing a sputtering film and improving characteristics and productivity of a ferroelectric film using the obtained thin film.SOLUTION: The sputtering target consists of a sintered body having a component composition represented by a composition formula in an atomic ratio: Bi(FeTi) O, 0.9≤x≤1.1, 0y≤0.3 and has less than 3.0 of an X-ray diffraction peak intensity ratio attributing to the (012) plane of metal Bi to a background intensity in X-ray diffraction and 500 or less kΩcm of a bulk resistivity. The method for manufacturing the target includes pressing and sintering powder obtained by weighing and mixing powder of BiO, FeOand TiOso as to be the component composition at a temperature of 650-750°C in a vacuum or inert gas atmosphere.SELECTED DRAWING: Figure 1