首页> 外国专利> METHOD AND SYSTEM FOR GROWING PLANT USING SILICATE-BASED SUBSTRATE, CULTIVATION OF ENHANCED PHOTOSYNTHETIC PRODUCTIVITY AND OPTICAL SAFETY BY UTILIZATION OF EXOGENOUS GLUCOPYRANOSIDES FOR ENDOGENOUS GLUCOPYRANOSIL-PROTEIN DERIVATIVES, AND FORMULATION, PROCESS, AND SYSTEM FOR THE SAME

METHOD AND SYSTEM FOR GROWING PLANT USING SILICATE-BASED SUBSTRATE, CULTIVATION OF ENHANCED PHOTOSYNTHETIC PRODUCTIVITY AND OPTICAL SAFETY BY UTILIZATION OF EXOGENOUS GLUCOPYRANOSIDES FOR ENDOGENOUS GLUCOPYRANOSIL-PROTEIN DERIVATIVES, AND FORMULATION, PROCESS, AND SYSTEM FOR THE SAME

机译:利用硅酸盐基基质生长植物的方法和系统,利用内源性葡糖苷-内酯衍生物衍生的外源葡糖苷来培养光合生产力和光学安全性,方法和系统,方法和系统

摘要

PROBLEM TO BE SOLVED: To provide a method for promoting plant growth based on a novel optical safety treatment regime.SOLUTION: According to the present invention, a method for promoting plant growth based on a novel optical safety treatment regime with glucopyranosides including glucopyranosil glucopyranosides, and aryl-α-D-glucopyranosides, and more specifically, with one or more compounds comprising terminal mannosyl-triose, optionally in the presence of light enhanced by one or more light reflecting and/or refracting members, such as silicon-based substrates. According to the present invention, furthermore, a chemical synthesis process for the compound for general application to a plant is disclosed. Silicate microbeads of the like are distributed over the ground or substrate in which roots of a plant are supported and planted, beneath and around the plant in a manner that light is refracted or reflected toward the phylloplane.SELECTED DRAWING: Figure 1
机译:解决的问题:提供一种基于新颖的光学安全处理方案的促进植物生长的方法。解决方案:根据本发明,基于新颖的光学安全处理方案的基于包括吡喃葡萄糖苷在内的吡喃葡萄糖苷来促进植物生长的方法,更具体地讲,与一种或多种包含末端甘露糖基三糖的化合物一起,任选地在一种或多种光反射和/或折射元件,例如基于硅的底物增强的光的存在下,与一种或多种包含末端甘露糖基三糖的化合物一起使用。此外,根据本发明,公开了用于一般用于植物的化合物的化学合成方法。诸如此类的硅酸盐微珠分布在地面或基质上,植物的根部被支撑并种植在该植物的下方和周围,其方式是使光折射或反射向叶面。图1:

著录项

  • 公开/公告号JP2017104131A

    专利类型

  • 公开/公告日2017-06-15

    原文格式PDF

  • 申请/专利权人 INNOVATION HAMMER LLC;

    申请/专利号JP20170041868

  • 发明设计人 ARTHUR M NONOMURA;

    申请日2017-03-06

  • 分类号A01G7;A01G9/20;A01P21;A01N43/16;

  • 国家 JP

  • 入库时间 2022-08-21 14:00:43

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