SILICA-BASED COMPOSITE FINE PARTICLE-DISPERSED LIQUID, METHOD FOR PRODUCING THE SAME, AND SLURRY FOR POLISHING CONTAINING SILICA-BASED COMPOSITE FINE PARTICLE-DISPERSED LIQUID

摘要

PROBLEM TO BE SOLVED: To provide a silica-based composite fine particle-dispersed liquid capable of performing polishing at a high speed even to an Si wafer and the material hard to be worked, simultaneously capable of attaining high face accuracy (such as a low scratch), and further capable of preferably being used for the polishing of the surface of a semiconductor device such as a semiconductor substrate and a wiring board.;SOLUTION: Provided is a silica-based composite fine particle-dispersed liquid containing silica-based composite fine particles in which the surface of a mother particle essentially consisting of amorphous silica is coupled with a child particle essentially consisting of crystalline ceria, having the following characteristics: that the mass ratio between the mother particle and the child particle is 100:11 to 316; that, when it is fed to X-ray diffraction, only the crystal phase of ceria is detected; that, when it is fed to X-ray diffraction, the crystallite diameter of the (111) face in the crystalline ceria is 10 to 25 nm; that the piece ratio of the particles in which the ratio between the minor axis/major axis measured by an image analysis method is 0.8 or lower is 50% or higher; and that the contents of Na or the like are 100 ppm or lower, respectively.;SELECTED DRAWING: Figure 1;COPYRIGHT: (C)2017,JPO&INPIT