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GLASS SUBSTRATE FOR MASK BLANK, MASK BLANK, AND PHOTOMASK

机译:蒙版空白,蒙版空白和照片蒙版的玻璃基质

摘要

PROBLEM TO BE SOLVED: To provide a glass substrate for mask blank, which can improve a measurement accuracy of flatness of a main surface, when an inclined surface is held by a flatness measurement apparatus.SOLUTION: A glass substrate for mask blank includes two main surfaces that are substantially parallel with each other, two side surfaces that are substantially parallel with each other and substantially vertical to the two main surfaces, and substantially flat four inclined surfaces each of which intersects at an obtuse angle with any one of the main surfaces and connects between any one of the main surfaces and any one of the side surfaces, each of the inclined surfaces has a center line that is parallel in the longer direction with each other, when two of the side surfaces are seen from a substantially vertical direction, an angle between a center line of the arbitrary one of the inclined surfaces adjacent to the side surfaces on one side and a center line of arbitrary one of the inclined surfaces adjacent to the side surface on the opposite side is 0 rad or larger and 0.001 rad or smaller.SELECTED DRAWING: Figure 1
机译:解决的问题:提供一种用于掩模坯料的玻璃基板,当通过平坦度测量设备保持倾斜表面时,其可以提高主表面的平坦度的测量精度。解决方案:用于掩模坯料的玻璃基板包括两个主要部分。彼此基本平行的表面,彼此基本平行并且与两个主表面基本垂直的两个侧表面以及基本平坦的四个倾斜表面,每个倾斜表面与主表面中的任一个以钝角相交。当连接两个主表面中的任意一个和两个侧面中的任意一个之间时,当从基本上垂直的方向看两个侧面时,每个倾斜表面具有在较长方向上彼此平行的中心线,与一侧上的侧面相邻的倾斜表面中的任意一个的中心线与该侧面中的任意一个的中心线之间的角度与相反侧的侧面相邻的倾斜表面为0 rad或更大且0.001 rad或更小。图1

著录项

  • 公开/公告号JP2017102411A

    专利类型

  • 公开/公告日2017-06-08

    原文格式PDF

  • 申请/专利权人 ASAHI GLASS CO LTD;

    申请/专利号JP20150237984

  • 发明设计人 HIRABAYASHI YUSUKE;HAKUMO KAZUAKI;

    申请日2015-12-04

  • 分类号G03F1/60;G03F1/50;G03F1/52;G03F1/54;G03F1/24;

  • 国家 JP

  • 入库时间 2022-08-21 13:58:26

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