Quantum dot array and quantum dot superlattice fabrication method
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机译:量子点阵列和量子点超晶格制造方法
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摘要
The present invention includes at least a step of (a) providing a crystalline semiconductor substrate surface, (b) depositing quantum dots on the substrate surface by sequential ionic layer adsorption and reaction (SILAR) method, A method for producing a dot array is provided. The above process can be repeated to create a quantum dot superlattice structure.
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