首页> 外国专利> An electrolytic apparatus for indium hydroxide powder or tin hydroxide powder, a method for producing indium hydroxide powder or tin hydroxide powder, and a method for manufacturing a sputtering target

An electrolytic apparatus for indium hydroxide powder or tin hydroxide powder, a method for producing indium hydroxide powder or tin hydroxide powder, and a method for manufacturing a sputtering target

机译:氢氧化铟粉末或氢氧化锡粉末的电解装置,氢氧化铟粉末或氢氧化锡粉末的制造方法以及溅射靶的制造方法

摘要

PROBLEM TO BE SOLVED: To provide an electrolytic device for indium hydroxide powder or tin hydroxide powder, in which the indium hydroxide powder or tin hydroxide powder having excellent particle size uniformity and a narrow particle size distribution width can be generated.SOLUTION: The electrolytic device 1 for electrolyzing indium or tin to generate indium hydroxide powder or tin hydroxide powder includes: an electrolytic cell 10 in which an electrolytic solution 11 is stored and a plurality of electrodes are arranged in parallel at predetermined intervals; an adjustment tank 20 for adjusting the electrolytic solution; a feed nozzle 32 which is arranged in the vicinity of a tank wall 17a of the electrolytic cell and used for jetting the electrolytic solution toward, at least, the space between electrodes in parallel with the width direction of the electrode; and a suction nozzle 34 which is arranged in the vicinity of the tank wall 17b of the electrolytic cell at a position opposed to the feed nozzle. The electrolytic solution is withdrawn from the electrolytic cell and jetted through the feed nozzle toward the adjustment tank side in parallel with the width direction of the electrode and the jetted electrolytic solution is sucked through the suction nozzle and transferred to the adjustment tank so that the electrolytic solution is circulated between the electrolytic cell and the adjustment tank.SELECTED DRAWING: Figure 1
机译:解决的问题:提供一种用于氢氧化铟粉末或氢氧化锡粉末的电解装置,其中可以产生具有优异的粒度均匀性和窄的粒度分布宽度的氢氧化铟粉末或氢氧化锡粉末。用于电解铟或锡以产生氢氧化铟粉末或氢氧化锡粉末的图1所示的电解池包括:电解池10,其中存储有电解液11,并且多个电极以预定间隔平行设置;以及调节槽20,用于调节电解液;进料喷嘴32,其布置在电解池的槽壁17a附近,用于至少朝着与电极的宽度方向平行的电极之间的空间喷射电解液。吸嘴34设置在电解池的槽壁17b的附近且与进料嘴相对的位置。电解液从电解池中抽出,并通过进料喷嘴平行于电极的宽度方向朝着调节槽一侧喷射,喷射出的电解液通过吸嘴吸入并转移到调节槽中,从而使电解液溶液在电解池和调节槽之间循环选定的图纸:图1

著录项

  • 公开/公告号JP6222072B2

    专利类型

  • 公开/公告日2017-11-01

    原文格式PDF

  • 申请/专利权人 住友金属鉱山株式会社;

    申请/专利号JP20140257776

  • 发明设计人 菅本 憲明;森本 敏夫;加茂 哲郎;

    申请日2014-12-19

  • 分类号C25B15/08;C25B15/02;C25B1/00;C25B9/00;C23C14/34;C01G15/00;C01G19/00;

  • 国家 JP

  • 入库时间 2022-08-21 13:56:19

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号