Eccentricity amount measuring method and eccentricity amount measuring device

摘要

A method of measuring an eccentricity amount by irradiating a light beam onto a test optical system arranged on a measurement axis, the method comprising: an acquiring step S100 of acquiring wavefront data on the basis of a light beam emitted from an optical system to be measured; A first extracting step S200 for extracting predetermined aberration components from the data, a second extracting step S300 for extracting a first aberration component from a predetermined aberration component, a first aberration component, a decentering aberration sensitivity and an eccentricity amount , Wherein the predetermined aberration component is an aberration component including an aberration component caused by decentering and the first aberration component is an aberration component of a predetermined aberration component Is an aberration component proportional to the first power of the eccentricity amount and the decentering aberration sensitivity is an aberration sensitivity proportional to the first power of the eccentricity amount.