Face material pattern finish simulation apparatus and face material pattern finish simulation method

摘要

The face material pattern finish simulation device is configured to obtain information on incident light incident on each pixel of the image indicating the finish of the pattern from information including a normal map and light source information of a light source that emits light irradiated on the surface. The incident light calculation unit (14) for calculating the incident light information, the incident light information, the normal map, the diffuse reflectance information on the pattern, and the gloss information indicating the gloss of the surface of the face material And, from the calculation information including the observation condition information of the face material, the reflected light calculation unit (15) for obtaining the radiance of the reflected light from the surface for each pixel of the image showing the finish of the pattern, A display unit (18) for displaying the image indicating the finish of the pattern on the surface of the face material obtained from the radiance for each pixel.