首页> 外国专利> Photosensitive transfer material, substrate having photosensitive low refractive index transfer layer, method for producing photosensitive low refractive index transfer layer, method for forming permanent film, and method for manufacturing optical device

Photosensitive transfer material, substrate having photosensitive low refractive index transfer layer, method for producing photosensitive low refractive index transfer layer, method for forming permanent film, and method for manufacturing optical device

机译:光敏转印材料,具有光敏低折射率转印层的基板,用于生产光敏低折射率转印层的方法,用于形成永久膜的方法以及用于制造光学器件的方法

摘要

It is an object of the present invention to provide a photosensitive transfer material having a low refractive index, high light transmission efficiency, and capable of obtaining a layer excellent in in-plane film thickness uniformity after transfer. The photosensitive transfer material of the present invention has at least a photosensitive low refractive index material layer on a support, and the photosensitive low refractive index material layer is composed of (Component A) hollow or porous particles and (Component B) A photopolymerization initiator, (Component C) a polymer having a polymerizable functional group, and (Component D) monomer. Further, the substrate of the present invention has a photosensitive low refractive index transfer layer obtained by transferring the photosensitive low refractive material layer from the photosensitive transfer material.
机译:本发明的目的是提供一种具有低折射率,高光透射效率并且能够在转印后获得面内膜厚均匀性优异的层的光敏转印材料。本发明的光敏转移材料在支撑体上至少具有光敏低折射率材料层,并且该光敏低折射率材料层由(组分A)中空或多孔颗粒和(组分B)光聚合引发剂组成, (组分C)具有可聚合官能团的聚合物,和(组分D)单体。另外,本发明的基板具有通过从感光性转印材料转印感光性低折射率材料层而得到的感光性低折射率转印层。

著录项

  • 公开/公告号JPWO2014077228A1

    专利类型

  • 公开/公告日2017-01-05

    原文格式PDF

  • 申请/专利权人 富士フイルム株式会社;

    申请/专利号JP20140546978

  • 发明设计人 中村 秀之;漢那 慎一;藤本 進二;

    申请日2013-11-12

  • 分类号G03F7/004;B32B7/02;B32B27/18;B32B27/30;G03F7/027;G03F7/038;G02B5/20;G02B1/111;F21S2/00;

  • 国家 JP

  • 入库时间 2022-08-21 13:53:04

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