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SOLUTION PRECURSOR PLASMA SPRAY OF CERAMIC COATING FOR SEMICONDUCTOR CHAMBER APPLICATIONS
SOLUTION PRECURSOR PLASMA SPRAY OF CERAMIC COATING FOR SEMICONDUCTOR CHAMBER APPLICATIONS
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机译:半导体腔应用的陶瓷涂层的溶液前驱体等离子体喷涂
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摘要
Disclosed herein are methods for producing an ultra-dense and ultra-smooth ceramic coating. A method includes feeding a solution comprising a metal precursor into a plasma sprayer. The plasma sprayer generates a stream toward an article, forming a ceramic coating on the article upon contact.
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