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PLASMA CVD DEVICE AND METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM
PLASMA CVD DEVICE AND METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM
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机译:等离子体化学汽相淀积装置和制造磁记录介质的方法
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摘要
A plasma CVD device includes a chamber (102), an anode (104), a cathode (103), a holding portion which holds a substrate to be deposited (101) a plasma wall (88) an anti-adhesion member (91) which is arranged between a first gap (81) between the anode and the plasma wall and a first inner surface (102a) of the chamber and a pedestal (92) which is arranged between the anti-adhesion member and a back surface of the anode and which is electrically connected to the anode. The maximum diameter of each of the first gap, a second gap (82) between the anode and the anti-adhesion member, a third gap (83) between the back surface of the anode and the pedestal, a fourth gap (84) between the plasma wall and the anti-adhesion member and a fifth gap (85) between the anti-adhesion member and the pedestal is equal to or less than 4 mm.
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