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EXTREME ULTRAVIOLET LIGHT GENERATING SYSTEM, EXTREME ULTRAVIOLET LIGHT GENERATING METHOD, AND THOMSON SCATTERING MEASUREMENT SYSTEM
EXTREME ULTRAVIOLET LIGHT GENERATING SYSTEM, EXTREME ULTRAVIOLET LIGHT GENERATING METHOD, AND THOMSON SCATTERING MEASUREMENT SYSTEM
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机译:极紫外光产生系统,极紫外光产生方法和汤姆森散射测量系统
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摘要
An extreme ultraviolet light generating system may include: a chamber; a target feeding unit configured to feed a target into the chamber; a drive laser unit configured to irradiate the target with a drive pulsed laser light beam to generate a plasma to thereby generate extreme ultraviolet light; a probe laser unit configured to irradiate the plasma with a probe pulsed laser light beam to thereby generate Thomson scattered light; a spectrometer configured to measure a spectrum waveform of an ionic term in the Thomson scattered light; and a wavelength filter disposed upstream of the spectrometer, and configured to suppress light with a predetermined wavelength from entering the spectrometer. The light with the predetermined wavelength may be part of light containing the Thomson scattered light, and the predetermined wavelength may be substantially same as a wavelength of the probe pulsed laser light beam.
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