首页> 外国专利> Iridium Tip, Gas Field Ion Source, Focused Ion Beam Apparatus, Electron Source, Electron Microscope, Electron Beam Applied Analysis Apparatus, Ion-Electron Multi-Beam Apparatus, Scanning Probe Microscope, and Mask Repair Apparatus

Iridium Tip, Gas Field Ion Source, Focused Ion Beam Apparatus, Electron Source, Electron Microscope, Electron Beam Applied Analysis Apparatus, Ion-Electron Multi-Beam Apparatus, Scanning Probe Microscope, and Mask Repair Apparatus

机译:铱尖,气田离子源,聚焦离子束设备,电子源,电子显微镜,电子束应用分析设备,离子电子多束设备,扫描探针显微镜和掩模修复设备

摘要

There is provided an iridium tip including a pyramid structure having one {100} crystal plane as one of a plurality of pyramid surfaces in a sharpened apex portion of a single crystal with 210 orientation. The iridium tip is applied to a gas field ion source or an electron source. The gas field ion source and/or the electron source is applied to a focused ion beam apparatus, an electron microscope, an electron beam applied analysis apparatus, an ion-electron multi-beam apparatus, a scanning probe microscope or a mask repair apparatus.
机译:提供了一种铱尖端,其在具有<210>取向的单晶的尖锐顶部中包括具有一个{100}晶面作为多个金字塔表面之一的金字塔结构。铱尖端被施加到气体场离子源或电子源。气场离子源和/或电子源应用于聚焦离子束设备,电子显微镜,施加电子束的分析设备,离子电子多束设备,扫描探针显微镜或掩模修复设备。

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