首页> 外国专利> Polishing apparatus having end point detecting apparatus detecting polishing end point on basis of current and sliding friction

Polishing apparatus having end point detecting apparatus detecting polishing end point on basis of current and sliding friction

机译:具有终点检测装置的抛光装置,该终点检测装置基于电流和滑动摩擦来检测抛光终点

摘要

A polishing apparatus includes: a polishing table 12 for holding a polishing pad; a first electric motor 14 that rotationally drives the polishing table 12; a first rotary joint 40 that has a rotating body 41 that is rotationally driven by the first electric motor 14, a housing 42 provided around the rotating body 41, and a seal portion 44 that seals between the rotating body 41 and the housing 42; a second current sensor 31 that detects a current which is correlated with driving load of the first electric motor 14; a friction detecting unit 50 that detects sliding friction in the seal portion 44 of the first rotary joint 40; and an end point detecting apparatus 60 that detects a polishing end point of the polishing target on the basis of the current and the sliding friction.
机译:抛光装置包括:用于保持抛光垫的抛光台 12 ;和第一电动机 14 旋转驱动抛光台 12 ;第一旋转接头 40 具有旋转体 41 由第一电动机 14,,围绕旋转体 41,设置的壳体 42 和密封部。 > 44 密封旋转体 41 与壳体 42之间; 第二个电流传感器 31 ,用于检测电流与第一电动机 14的驱动负荷相关; 摩擦检测单元 50 ,其检测第一旋转体的密封部分 44 中的滑动摩擦接头 40; 和终点检测装置 60 ,其基于电流和滑动摩擦来检测抛光目标的抛光终点。

著录项

  • 公开/公告号US9757838B2

    专利类型

  • 公开/公告日2017-09-12

    原文格式PDF

  • 申请/专利权人 EBARA CORPORATION;

    申请/专利号US201514727234

  • 发明设计人 HIROYUKI SHINOZAKI;

    申请日2015-06-01

  • 分类号B24B49/10;B24B49/16;B24B37/013;B24B37/10;G01N19/02;

  • 国家 US

  • 入库时间 2022-08-21 13:49:06

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