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QUAD CHAMBER AND PLATFORM HAVING MULTIPLE QUAD CHAMBERS

机译:具有多个quad成员的quad室和平台

摘要

A method and apparatus for processing substrates includes a chamber defining a plurality of processing regions, a heater disposed centrally within each pair of processing regions, each heater having a first major surface and a second major surface opposing the first major surface, each of the first major surfaces defining a first substrate receiving surface and each of the second major surfaces defining a second substrate receiving surface, and a showerhead positioned in an opposing relationship to each of the first substrate receiving surfaces and each of the second substrate receiving surfaces of the heaters.
机译:一种用于处理基板的方法和设备,包括:腔室,其限定了多个处理区域;加热器,其被设置在每对处理区域的中央,每个加热器具有第一主表面和与第一主表面相对的第二主表面,每个第一主表面限定第一基板接收表面的主表面和限定第二基板接收表面的每个第二主表面,以及以与加热器的每个第一基板接收表面和每个第二基板接收表面相对的关系定位的喷头。

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