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STRESS MEASURING METHOD, STRESS MEASURING MEMBER, AND STRESS MEASURING SET

机译:应力测量方法,应力测量构件和应力测量装置

摘要

The present invention provides a stress measuring method including: irradiating a photoelastic product including a measurement subject with light penetrating a linear polarizing film and a phase difference film in this order, and detecting reflected light from the product which is derived from the light via the phase difference film and the linear polarizing film in this order, in which in-plane retardation Re (550) of the phase difference film with light having a wavelength of 550 nm satisfies 100 nm≦Re (550 nm)≦700 nm, and in-plane retardation Re (450) of the phase difference film with light having a wavelength of 450 nm satisfies Re (450)/Re (550)≧0.9, a stress measuring member including the linear polarizing film and the phase difference film, and a stress measuring set including the stress measuring member and a stress displaying member including a photoelastic layer.
机译:本发明提供一种应力测量方法,该方法包括:以依次穿过线偏振膜和相差膜的光照射包括被测物的光弹性产品,并检测从该产品经由相产生的反射光。差膜和线性偏振膜的顺序,其中具有550 nm波长的光的相差膜的面内延迟Re(550)满足100 nm≤Re(550 nm)≤700 nm,并且-具有450nm的波长的光的相差膜的平面延迟Re(450)满足Re(450)/ Re(550)≥0.9,包括线性偏振膜和相差膜的应力测量构件以及应力包括应力测量构件和应力显示构件的测量装置,该应力显示构件包括光弹性层。

著录项

  • 公开/公告号US2017030785A1

    专利类型

  • 公开/公告日2017-02-02

    原文格式PDF

  • 申请/专利权人 FUJIFILM CORPORATION;

    申请/专利号US201615292469

  • 发明设计人 TAKAHIRO HAYASHI;

    申请日2016-10-13

  • 分类号G01L1/24;

  • 国家 US

  • 入库时间 2022-08-21 13:46:29

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