首页> 外国专利> Structure and method for testing stacked CMOS structure

Structure and method for testing stacked CMOS structure

机译:测试堆叠式CMOS结构的结构及方法

摘要

A test structure is provided for testing a semiconductor structure having a plurality of tiers. The test structure includes at least one conductive loop. Each respective conductive loop has ends defining at least one opening between the ends, and is embedded inside one or more of the plurality of tiers in the semiconductor structure. The test structure also includes at least two test pads on each respective conductive loop. The at least two test pads are connected with respective ends of each respective conductive loop. The test structure is configured to permit detection of defects within each of the plurality of tiers in the semiconductor structure if the defects exist, using a testing apparatus.
机译:提供一种用于测试具有多层的半导体结构的测试结构。该测试结构包括至少一个导电回路。每个相应的导电环具有在端部之间限定至少一个开口的端部,并且被嵌入在半导体结构中的多个层中的一个或多个层的内部。测试结构在每个相应的导电回路上还包括至少两个测试垫。至少两个测试垫与每个相应的导电回路的相应的端部连接。该测试结构被配置为允许使用测试设备在半导体结构的多个层中的每一个中存在缺陷的情况下进行检测。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号