首页>
外国专利>
Exposure apparatus with irradiation device for irradiating optical element with pulsed light having infrared wavelength, and corresponding exposure method
Exposure apparatus with irradiation device for irradiating optical element with pulsed light having infrared wavelength, and corresponding exposure method
展开▼
机译:具有用于向光学元件照射具有红外波长的脉冲光的照射装置的曝光装置及相应的曝光方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
The present invention provides an exposure apparatus for exposing a shot on a substrate to first pulsed light, the apparatus including an optical element for guiding the first pulsed light to the substrate, an irradiation device configured to irradiate the optical element with second pulsed light having an infrared wavelength which the first pulsed light has less than the second pulsed light has, and a controller configured to control the irradiation device in a process of exposing the shot to the first pulsed light plural times, such that the irradiation device irradiates the optical element with the second pulsed light during at least one period of non-irradiation periods in which the shot is not irradiated with the first pulsed light.
展开▼