0≦(Ti %/10)+(Cr %/25)+(Mo %/10)+(W %/6)+(Ni %/10)+(Al %/10)+(C %/1)≦1.00,the balance being Fe and unavoidable impurities, and having a particle diameter of 75 μm or less. The powder, which has high hardness and is inexpensive, is particularly suitable for a powder for a projecting material for shot peening."/> High-hardness atomized powder, powder for projecting material for shot peening, and shot peening method using same
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High-hardness atomized powder, powder for projecting material for shot peening, and shot peening method using same

机译:高硬度雾化粉末,用于喷丸处理的投射材料粉末以及使用该粉末的喷丸方法

摘要

There is disclosed a high-hardness atomized powder comprising in mass %: 2 to 8% of B; and one or two or more of Ti, Cr, Mo, W, Ni, Al, and C in an amount satisfying the following expression:0≦(Ti %/10)+(Cr %/25)+(Mo %/10)+(W %/6)+(Ni %/10)+(Al %/10)+(C %/1)≦1.00,the balance being Fe and unavoidable impurities, and having a particle diameter of 75 μm or less. The powder, which has high hardness and is inexpensive, is particularly suitable for a powder for a projecting material for shot peening.
机译:公开了一种高硬度雾化粉末,其包含按质量%计:2至8%的B;和Ti,Cr,Mo,W,Ni,Al和C中的一种或两种以上满足以下表达式的量:<?in-line-formulae description =“在线表达式” end =“ lead”?> 0≦(Ti%/ 10)+(Cr%/ 25)+(Mo%/ 10)+(W%/ 6 )+(Ni%/ 10)+(Al%/ 10)+(C%/ 1)≦1.00,<?在线式description =“在线式” end =“ tail”?>其余部分为Fe和不可避免的杂质,并且具有75μm或更小的粒径。该粉末具有高硬度且廉价,特别适合用于喷丸处理的突出材料的粉末。

著录项

  • 公开/公告号US9656371B2

    专利类型

  • 公开/公告日2017-05-23

    原文格式PDF

  • 申请/专利权人 TOSHIYUKI SAWADA;

    申请/专利号US201214006796

  • 发明设计人 TOSHIYUKI SAWADA;

    申请日2012-03-23

  • 分类号C22C38/00;B22F9/08;B24C1/10;B24C11/00;C22C33/02;

  • 国家 US

  • 入库时间 2022-08-21 13:45:04

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