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SCAFFOLD-FREE 3D POROUS ELECTRODE AND METHOD OF MAKING A SCAFFOLD-FREE 3D POROUS ELECTRODE

机译:无支架的3D多孔电极和制造无支架的3D多孔电极的方法

摘要

A scaffold-free 3D porous electrode comprises a network of interconnected pores, where each pore is surrounded by a multilayer film including a first layer of electrochemically active material, one or more monolayers of graphene on the first layer of electrochemically active material, and a second layer of electrochemically active material on the one or more monolayers of graphene. A method of making a scaffold-free 3D porous electrode includes depositing one or more monolayers of graphene onto a porous scaffold to form a graphene coating on the porous scaffold, and depositing a first layer of an electrochemically active material onto the graphene coating. The porous scaffold is removed to expose an underside of the graphene coating, and a second layer of the electrochemically active material is deposited onto the underside of the graphene coating, thereby forming the scaffold-free 3D porous electrode.
机译:不含支架的3D多孔电极包括相互连接的孔网络,其中每个孔都由多层膜围绕,该多层膜包括第一层电化学活性材料,第一层电化学活性材料上的一个或多个石墨烯单层以及第二层一层或多层石墨烯上的一层电化学活性材料。一种制造无支架的3D多孔电极的方法,包括将一个或多个石墨烯单层沉积到多孔支架上以在多孔支架上形成石墨烯涂层,以及将电化学活性材料的第一层沉积到石墨烯涂层上。去除多孔支架以暴露石墨烯涂层的底侧,并且将电化学活性材料的第二层沉积到石墨烯涂层的底侧上,从而形成无支架的3D多孔电极。

著录项

  • 公开/公告号US2016351886A1

    专利类型

  • 公开/公告日2016-12-01

    原文格式PDF

  • 申请/专利号US201615163003

  • 发明设计人 PAUL V. BRAUN;JINYUN LIU;

    申请日2016-05-24

  • 分类号H01M4/04;H01M4/133;H01M4/38;H01M4/134;H01M4/48;H01M10/0525;H01M4/131;

  • 国家 US

  • 入库时间 2022-08-21 13:45:00

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