首页> 外国专利> CLOSED-LOOP RESONATOR SILICON GERMANIUM PHOTODETECTOR APPARATUS AND OTHER SEMICONDUCTOR DEVICES INCLUDING CURVED-SHAPE SILICONE GERMANIUM STRUCTURES

CLOSED-LOOP RESONATOR SILICON GERMANIUM PHOTODETECTOR APPARATUS AND OTHER SEMICONDUCTOR DEVICES INCLUDING CURVED-SHAPE SILICONE GERMANIUM STRUCTURES

机译:闭环谐振器硅锗光电探测器设备和其他半导体器件,包括弯曲形状的硅锗结构

摘要

Semiconductor devices, such as photonics devices, employ substantially curved-shaped Silicon-Germanium (SiGe) structures and are fabricated using zero-change CMOS fabrication process technologies. In one example, a closed-loop resonator waveguide-coupled photodetector includes a silicon resonator structure formed in a silicon substrate, interdigitated n-doped well-implant regions and p-doped well-implant regions forming multiple silicon p-n junctions around the silicon resonator structure, and a closed-loop SiGe photocarrier generation region formed in a pocket within the interdigitated n-doped and p-doped well implant regions. The closed-loop SiGe region is located so as to substantially overlap with an optical mode of radiation when present in the silicon resonator structure, and traverses the multiple silicon p-n junctions around the silicon resonator structure. Electric fields arising from the respective p-n silicon junctions significantly facilitate a flow of the generated photocarriers between electric contact regions of the photodetector.
机译:诸如光子学器件之类的半导体器件采用基本弯曲的硅锗(SiGe)结构,并使用零变化CMOS制造工艺技术进行制造。在一个示例中,闭环谐振器波导耦合的光电检测器包括在硅衬底中形成的硅谐振器结构,在硅谐振器结构周围形成多个硅pn结的叉指式n掺杂阱注入区和p掺杂阱注入区。 ,以及在叉指的n掺杂和p掺杂阱注入区域内的凹穴中形成的闭环SiGe光载流子产生区域。闭环SiGe区域的位置使得当存在于硅谐振器结构中时基本上与辐射的光学模式重叠,并且横越硅谐振器结构周围的多个硅p-n结。由各个p-n硅结产生的电场极大地促进了所产生的光载流子在光电探测器的电接触区域之间的流动。

著录项

  • 公开/公告号US2017040487A1

    专利类型

  • 公开/公告日2017-02-09

    原文格式PDF

  • 申请/专利权人 LUCA ALLOATTI;

    申请/专利号US201615332877

  • 发明设计人 LUCA ALLOATTI;

    申请日2016-10-24

  • 分类号H01L31/18;H01L31/0312;G02B6/12;H01L31/0224;H01L31/11;G02B6/293;H01L31/0232;H01L31/0352;

  • 国家 US

  • 入库时间 2022-08-21 13:44:35

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